The $400 million machine powering the future of chipmaking
The AI era needs ever faster chips. ASML has a monopoly on the expensive contraptions needed to pattern them. Can anyone catch up?
lithography
Open Artwork System Interchange Standard
file format used for specification of data structures for photomask production
How to Overcome the Advanced Node Physical Verification...
This blog looks at the details of how Synopsys IC Validator can overcome the advanced node physical verification bottleneck.
Microsoft-backed startup raises $40 million for advanced chipmaking equipment tech
Lace, a Norway-headquartered chipmaking equipment startup which is backed by Microsoft, has raised $40 million in funding to further develop a technology that could enable significant advances in semiconductor design and manufacturing, the company said on Monday.
Charting The Frontiers Of Photomask Technology And Extreme Ultraviolet Lithography
Modeling, simulation, and digital twins enable EUV innovation.
Application Specific Lithography: Avoiding Stochastic Defects and Image Imb
The discussion of any particular lithographic application often refers to…
Nvidia Tackles Chipmaking Process, Claims 40X Speed Up with cuLitho
Faster masks, less power.
Reducing Transistor Capacitance At The 5nm Node Using A Source/Drain Contact Recess
On how to reduce transistor capacitance at the 5nm node using a source/drain contact recess.
TSMC and NVIDIA Transform Semiconductor Manufacturing With Accelerated Computing | NVIDIA Blog
TSMC is moving to production with the NVIDIA cuLitho computational lithography platform to accelerate manufacturing of advanced semiconductor chips.